Collection: Silicon-Nitride on Corning 7980
Silicon Nitride (Si₃N₄) on Corning 7980 offers excellent mechanical strength, thermal stability, and electrical insulation, making it ideal for advanced research in photonics, microelectronics, and optoelectronic devices. The combination of Si₃N₄ with Corning 7980’s high-purity fused silica ensures optimal performance in demanding applications.
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Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm
Specifications: Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1.3um +/- 5% Si3N4 covers both si...
Regular price $0.00Regular priceUnit price / per -
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x10x0.5mm
Specifications: Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1.3um +/- 5% Si3N4 covers both si...
Regular price $0.00Regular priceUnit price / per -
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um
Specifications: Silicon Nitride Film Si3N4 Film-coated by low-stress LPCVD method Si3N4 Thickness: 1.3um +/- 5% Si3N4 covers both si...
Regular price $0.00Regular priceUnit price / per