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MTI Corporation

Aluminium Nitride (AlN) Template on 4" Silicon (Si <111>, P type, B-doped) 4"x 500 nm - FmAlNonSiBc101D05C1FT500nmUS

Aluminium Nitride (AlN) Template on 4" Silicon (Si <111>, P type, B-doped) 4"x 500 nm - FmAlNonSiBc101D05C1FT500nmUS

Specifications:

  • Useful area: 90%
  • Nominal AlN thickness: 500nm ±10%, one side coated, undoped AlN film
  • Front Surface: as-grown
  • Back surface: silicon as received
  • AlN orientation: C-plane (00.1)
  • Macro Defect Density: <10/cm^2
  • Wafer base: Silicon [111] P type,  4" dia x 0.5 mm, , one side polished, R<5 ohm.cm

MPN: FmAlNonSiBc101D05C1FT500nmUS

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