Nickel <111> Film( 100nm) Coated Si Wafer (100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cm

Film Specifications

• Nickel Film Thickness: 100nm
• Film Crystallinity:   (111) - oriented polycrystals

Silicon Wafer Specifications:

• Conductive type:        Si   P- type, B-doped
  
• Resistivity:                  1-20  ohm-cm
• Size:                          10x10x0.5mm
• Orientation:                (100) +/- 0.5^o
• Polish:                        One  sides  polished
• Surface roughness:     Prime
• Packing:                      Vacuum packed 
  
• Optional:  you may need tool below to handle the wafer ( click picture to order )