MTI
Nickel-Coated on Silicon
Nickel-Coated on Silicon
1. Nickel Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron SSP R:1-20 ohm.cm
Nickel Metallic Film
- Nickel Thickness: 100nm
- Film Crystallinity: (111) - oriented polycrystals
- Roughness, RMS: N/A
Silicon Wafer Specifications:
- Conductive type: Si P- type, B-doped
- Resistivity: 1-20 ohm-cm
- Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mm th
- Orientation: (100) +/- 0.5o
- Polish: One sides polished
- Surface roughness: Prime
- Packing: Vacuum packed on a 4" single wafer carrier
2. Nickel Film( 100nm) Coated Si Wafer (100) P/Boron 10x10x0.5mmSSP R:1-20 ohm.cm
Nickel Metallic Film
Film Specifications:
- Nickel Film Thickness: 100nm
- Film Crystallinity: (111) - oriented polycrystals
Silicon Wafer Specifications:
- Conductive type: Si P- type, B-doped
- Resistivity: 1-20 ohm-cm
- Size: 10x10x0.5mm
- Orientation: (100) +/- 0.5o
- Polish: One side polished
- Surface roughness: Prime
- Packing: Vacuum packed
3. Nickel Film (100nm) Coated SiO2/Si Wafer -(100) P/Boron 10x10x0.5mmSSP R:1-20 ohm.cm
Nickel Film
- Nickel Film Thickness: 100nm
- Film Crystallinity: (111) - oriented polycrystals
Silicon Wafer Specifications:
- Conductive type: Si P- type, B-doped
- Resistivity: 1-20 ohm-cm
- Size: 10x10x0.5mm
- SiO2 Thickness: 300 nm
- Orientation: (100) +/- 0.5o
- Polish: One sides polished
- Surface roughness: Prime
- Packing: Vacuum packed on a 4" single wafer carrier