Undoped Aluminium Nitride (AlN) Template on Silicon (Si <111> P type)

AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.

Specifications

• Useful area: 90%
• Nominal AlN thickness (2 options available):
• 500nm ±10%, one side coated, undoped AlN film
• 200nm ±10%, one side coated, undoped AlN film
• Front Surface: <1nm RMS, as-grown
• Back surface: silicon as received
• AlN orientation: C-plane (00.1)
• Macro Defect Density: <1/cm^2 (for 200nm AlN film); <10/cm^2 (for 500nm AlN film)
• Wafer base: Silicon [111] P-type, one side polished

Download (MSD) for Aluminium Nitride (AlN)