Boron Nitride Film on Silicon Wafer

Boron nitride is a chemical compound with the chemical formula BN, consisting of equal numbers of boron and nitrogen atoms. BN film is amorphous. Its hardness is inferior only to diamond, but its thermal and chemical stability is superior. Low-pressure deposition of thin films of boron nitride is grown on Si (100) wafers for this product by sputtering

• BN Film coated by sputtering method
• The amorphous structure ( no orientation)
• Dielectric
• BN Thickness: 24 nm +/- 10%
• Purity: > 99.99%

Silicon Wafer Specifications:

• Conductive type: Si n-type
• Resistivity: 0.1-1.0 ohm-cm
• Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mm ( thickness)
• Orientation: (100) +/- 0.5o
• Polish: One sides polished
• Surface roughness: Prime
• Packing: Vacuum packed on a 4" single wafer carrier box