Collection: Thin Film on Substrate
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ZnO Film on Fused Silca
ZnO on Fused Silica could be employed in areas such as coatings, sensors, electronic devices, or any other field where the unique propert...
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TiO2 Coated Sodalime Glass
TiO2( 150nm) Coated Sodalime Glass 1" x1"x 0.7mm Specifications: TiO2 Coated Sodalime Glass Dimension: 1" x1"x 0.7mm Polish: both sides ...
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Silicon-on-Sapphire (11-02, R Plane )
Silicon on sapphire (SOS) is a hetero-epitaxial process for integrated circuit manufacturing that consists of a thin layer (typically thi...
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ZnO Thin Film on Sapphire
ZnO Template Specifications: Film: ZnO Film thickness: 500 nm ( 0.5 um) Total Thickness Variation: 5% Resistivity: 10-1000 ohm.cm Film o...
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Boron Nitride Film on Silicon Wafer
Boron nitride is a chemical compound with the chemical formula BN, consisting of equal numbers of boron and nitrogen atoms. BN film is am...
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Au(Gold)/Ti(Titanium) coated Silicon Wafer/Microscope Glass Slides
High quality glass, standard microscope slides coated with gold and a 5nm Titanium adhesion layer between the glass slide surface and the...
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Graphene Film on Ni/SiO2/Si
Graphene film on Ni/SiO2/Si 100mm diameter Graphene™ films are grown directly on a Ni/SiO2/Si deposited on an oxidized silicon wafer usin...
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SiC Film (3C) on Si wafer
SiC-3C N-type Film on Silicon (111) Wafer, Film: 1.0um Thick substrate size: 10x10x1.0mm Specifications: Film: SiC Epi film with 3C st...
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Nickel-Coated on Silicon
1. Nickel Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron SSP R:1-20 ohm.cm Nickel Metallic Film Nickel Thicknes...
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Thermal Oxide Wafer SiO2 on Si (100) N Type
Thermal oxide or silicon dioxide layer is formed on bare silicon surface at temperature range from 900°C ~ 1200°C . Compared to CVD depos...
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PET Film with Single Side Peal-able Silicon Coating (200 mm width x 100um thick, 100 meter/roll) - EQ-CS-PET-200
EQ-CS-PET-200 is a polyester (PET) Film with single side peal-able silicon Coating. Such a plastic substrate is widely used for Roll-to-R...
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Silicon Nitride Film
1. 100 nm Silicon Nitride Film (PE-CVD) on Si(100)P-type B-doped 100 mm dia .x0.525mm thick 1sp R:0.001-0.005 ohm.cm Silicon Nitride Film...
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Undoped Aluminium Nitride (AlN) Template on Sapphire (0001)
AlN Template on sapphire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way t...
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Mo-Coated Sodalime Glass
1. 500nm-thick Mo-coated Sodalime Glass 100 mm(L) x 100 mm(W) x 1.1 mm thick Specifications: Mo-coated Sodalime glass -Thickness of high...
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Fluorine-Tin-Oxide (FTO) Glass Substrate (TEC 70)
1. Dimensions 100x100 x 3.2 mm R:58-72 ohm/sq 25pcs /pack Specifications: Fluorine-Tin-Oxide (FTO) coated Glass Plates ( Corning brand-T...
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Undoped Aluminium Nitride (AlN) Template on Silicon (Si <111>, N type)
Aluminium Nitride (AlN) Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN sin...
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Fluorine-Tin-Oxide (FTO) Glass Substrate (TEC 15)
1. Dimensions 1" x 1" x 2.2 mm R:12-14 ohm/sq 25pcs /pack Specifications: Fluorine-Tin-Oxide (FTO) coated Glass Plates (TEC15 ) Dimensi...
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Undoped Aluminium Nitride (AlN) Template on Silicon (Si <111> P type)
AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrat...
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Fluorine-Tin-Oxide (FTO) Glass Substrate (TEC 7)
1. Dimensions 1" x 1" x 1.1 mm R: 7-10 ohm/sq 25pcs /pack Specifications: Fluorine-Tin-Oxide (FTO) Coated on Glass Plates Dimension: 1" ...
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Aluminum Film on Silicon Wafer , 3 microns / 4" -- Al-Si-100-3um ,Si(100)
Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) 1. Aluminum Metallic Film: P-type B-doped R:1-20 ohm.cm Film-c...
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