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Cu Film on Ta/Silicon Wafer , Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x5x0.525mm,R:1-20 ohm.cm, 1sp
Specifications: Cu coated Si Wafer ( 10x5 mm size ) Thickness of highly oriented polycrystalline Cu <111> film: 100 nm Thickness o...
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CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 2sp - FmCeO2onYSZc101005S2FT40nm
Specifications: Epitaxial thin Film Composition: <111> CeO2 Epitaxial Film Thickness: 40 nm +/- 10 nm Epitaxial FWHM: < ...
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CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm,2sp - FmCeO2onYSZa101005S2FT40nm
Specifications: Epitaxial thin Film Composition: <100> CeO2 Epitaxial Film Thickness: 40 nm +/- 10 nm Epitaxial FWHM: <...
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CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 1sp - FmCeO2onYSZc101005S1FT40nm
Specifications: Epitaxial thin Film Composition: <111> CeO2 Epitaxial Film Thickness: 40 nm +/- 10 nm Epitaxial FWHM: <...
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CeO2 Film (40 nm one side) on YSZ <110> 10x10x0.5 mm - FmCeO2onYSZe101005S1FT40nm
Specifications: Epitaxial thin Film Composition: <110> CeO2 Epitaxial Film Thickness: 40 nm +/- 10 nm Epitaxial FWHM: <...
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CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm - FmCeO2onYSZa101005S1FT40nm
Specifications: Epitaxial thin Film Composition: <100> CeO2 Epitaxial Film Thickness: 40 nm +/- 10 nm Growth method: Spin ...
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Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1
Aluminium Metallic Film Specifications: Film-coated by E-beam evaporation under vacuum below 10-6 torr Evaporation rate: 0.2 nanometer p...
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Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um ,Si(100) N-type, R:<0.005 ohm.cm - FmAlonSiAsa101D0525C1FT3um
Aluminium Metallic Film Specifications: Film coated by E-beam evaporation under vacuum below 1xE-6 torr Evaporation rate: 0.2 nanometer ...
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Aluminium Film on Silicon Wafer , 3 microns / 4" -- Al-Si-100-3um ,Si(100) P-type B-doped R:1-20 ohm.cm
Aluminium Metallic Film Specifications: Film-coated by E-beam evaporation under vacuum below 10-6 torr Evaporation rate: 0.2 manometer p...
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Undoped Aluminium Nitride (AlN) Template on Silicon ( Si <111> P type ) 5mmx5mm x 200 nm - FmAlNonSiBc050505S1FT200nm
AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrat...
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Undoped Aluminium Nitride (AlN) Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS
Aluminium Nitride (AlN) Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN sin...
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Aluminium Nitride (AlN) Template on 4" Silicon (Si <111>, P type, B-doped) 4"x 500 nm - FmAlNonSiBc101D05C1FT500nmUS
Specifications: Useful area: 90% Nominal AlN thickness: 500nm ±10%, one side coated, undoped AlN film Front Surface: as-grown Back surf...
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Aluminium Nitride (AlN) Ceramic Substrate 114.3mm x114.3mm x 0.5mm, as lapped on both sides - CmAlN11411405SN
Specifications: AlN Ceramic Substrate made by tape casting Purity: > 99% (AN5116) Thermal Conductivity (W/m. K): >170 Size: 114.3 ...
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Aluminium Nitride (AlN) Ceramic Substrate 2"x2"x0.254mm, as lapped, CmAlN50500254SN
Specifications: AlN Ceramic Substrate made by tape casting Purity: > 99% (AlN5116) Thermal Conductivity (W/m.K): >170 Size: 2'' x ...
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Aluminium Nitride (AlN) Ceramic Substrate 10x10x 0.5mm, 1SP - CmAlN101005S1
Specifications: AlN Ceramic Substrate made by tape casting Purity: > 99% (AN5116) Size: 10 x 10 x 0.5 mm Polishing: one side polishe...
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Aluminium Nitride (AlN) Ceramic Substrate 1"x1"x 0.635mm, fine ground
Specifications: AlN Ceramic Substrate made by tape casting Purity: > 99% (AlN5116) Size: 1" x 1" x 0.635 mm Polishing: Fine Ground Su...
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Aluminium Nitride (AlN) Ceramic Substrate 1"x1"x 0.5mm, 1SP - CmAlN252505S1
Specifications: AlN Ceramic Substrate made by tape casting Purity: > 99% (AlN5116) Size: 1" x 1" x 0.5 mm Polishing: one side polishe...
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Anode Powders for Li-ion Battery
Choose from our range of high-quality Anode Powders for Li-ion Batteries, including composite powder, polycrystalline powder and nano-pow...
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Cathode Powders for Li-ion Battery
Choose from our range of high-quality Cathode Powders for Li-ion Batteries, including single crystals and precursor powders. Download the...
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ZnO Film on Fused Silca
Specifications: ZnO Coated Fused silica Fused Silica: Both sides optical polished Dimension (two options available): 10x10x0.5mm 1" x1"...
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TiO2( 150nm) Coated Sodalime Glass 1" x1"x 0.7mm
Specifications: TiO2 Coated Sodalime Glass Dimension: 1" x1"x 0.7mm Polish: both sides are optically clear Nominal TiO2 film thickness: ...
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ZnO Thin Film on Sapphire
ZnO Template Specifications: Film: ZnO Film thickness: 500 nm ( 0.5 um) Total Thickness Variation: 5% Resistivity: 10-1000 ohm.cm Film o...
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Boron Nitride Film on Silicon Wafer
Boron Nitride Film Specifications: BN Film coated by sputtering method The amorphous structure ( no orientation) Dielectric BN Thickness...
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Au(Gold)/Ti(Titanium) Coated Microscope Slides,Gold layer thickness: 100nm or 50nm,Glass slide: 75 x 25x1.1mm, purity of Au: 4N5
Specifications: Glass slide: 75 x 25mm , 1.1 mm thickness, soda lime glass with both sides polished Titanium adhesion layer thickness:...
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